CUED Publications database

Large area nanometer thickness graphite freestanding film without transfer process

Kim, TS and Shin, DW and Kim, SG and Kim, MJ and Yoo, JB (2017) Large area nanometer thickness graphite freestanding film without transfer process. Chemical Physics Letters, 690. pp. 101-104. ISSN 0009-2614

Full text not available from this repository.

Abstract

We fabricated the large-area (3 × 3 cm ) freestanding nanometer thickness graphite film (NGF) using transfer free process. NGF was grown on Cu foil using CVD and Cu foil is used as the frame of NGF freestanding film. Thickness of the NGF was controlled by gas flow and growth time. Transfer-free process was achieved by selective etching of Cu foil and dipping NGF in alcohol of low surface tension. Freestanding NGF reveals excellent EUV transmittance. This method allowed us to simplify the fabrication process for freestanding film without transfer process and demonstrated a possibility for HVM of pellicle for EUV lithography. 2

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 18 Mar 2019 20:06
Last Modified: 01 Apr 2021 04:50
DOI: 10.1016/j.cplett.2017.10.046