Hofmann, S and Cantoro, M and Kleinsorge, B and Casiraghi, C and Parvez, A and Robertson, J and Ducati, C (2005) Effects of catalyst film thickness on plasma-enhanced carbon nanotube growth. Journal of Applied Physics, 98. ISSN 0021-8979Full text not available from this repository.
A systematic study is presented of the influence of catalyst film thickness on carbon nanostructures grown by plasma-enhanced chemical-vapor deposition from acetylene and ammonia mixtures. We show that reducing the Fe/Co catalyst film thickness below 3 nm causes a transition from larger diameter (>40 nm), bamboolike carbon nanofibers to small diameter (similar to 5 nm) multiwalled nanotubes with two to five walls. This is accompanied by a more than 50 times faster growth rate and a faster catalyst poisoning. Thin Ni catalyst films only trigger such a growth transition when pretreated with an ammonia plasma. We observe a limited correlation between this growth transition and the coarsening of the catalyst film before deposition. For a growth temperature of <= 550 degrees C, all catalysts showed mainly a tip growth regime and a similar activity on untreated silicon, oxidized silicon, and silicon nitride support. (c) 2005 American Institute of Physics.
|Additional Information:||Aug 1 Effects of catalyst film thickness on plasma-enhanced carbon nanotube growth 955RV Times Cited:31 Cited References Count:53 English|
|Uncontrolled Keywords:||thin-films CHEMICAL-VAPOR-DEPOSITION arrays density IN-SITU low-temperature metal patterned growth fe catalyst selective growth|
|Depositing User:||Cron Job|
|Date Deposited:||04 Nov 2011 15:46|
|Last Modified:||22 Jan 2014 19:01|
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