Li, FM and Nathan, A and Wu, Y and Ong, BS (2008) A comparative study of plasma-enhanced chemical vapor gate dielectrics for solution-processed polymer thin-film transistor circuit integration. Journal of Applied Physics, 104. ISSN 0021-8979
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 20 Jan 2012 12:11 |
| Last Modified: | 20 May 2013 01:33 |
| DOI: |
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