CUED Publications database

Local hydrogen reactions of H*<inf>2</inf> in a-Si:H

Robertson, J and Chen, CW and Powell, MJ and Deane, SC (1998) Local hydrogen reactions of H*<inf>2</inf> in a-Si:H. Journal of Non-Crystalline Solids, 227-23. pp. 138-142. ISSN 0022-3093

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Abstract

Hydrogen rearrangements at the H*2 complex are used as a model of low energy, local transitions in the two-hydrogen density of states of hydrogenated amorphous silicon (a-Si:H). These are used to account for the low activation energy motion of H observed by nuclear magnetic resonance, the low energy defect annealing of defects formed by bias stress in thin film transistors, and the elimination of hydrogen from the growth zone during the low temperature plasma deposition of a-Si:H. © 1998 Elsevier Science B.V. All rights reserved.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 02 Sep 2016 16:35
Last Modified: 01 Dec 2016 07:13
DOI: