Fritschi, R and Frédérico, S and Hibert, C and Flückiger, P and Renaud, P and Tsamados, D and Boussey, J and Chovet, A and Ng, RKM and Udrea, F and Curty, J-P and Dehollain, C and Declercq, M and Ionescu, AM (2004) High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining. Microelectronic Engineering, 73-74. pp. 447-451. ISSN 0167-9317Full text not available from this repository.
|Divisions:||Div B > Electronics, Power & Energy Conversion|
|Depositing User:||Cron Job|
|Date Deposited:||07 Mar 2014 11:52|
|Last Modified:||10 Mar 2014 16:33|
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