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High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining

Fritschi, R and Frédérico, S and Hibert, C and Flückiger, P and Renaud, P and Tsamados, D and Boussey, J and Chovet, A and Ng, RKM and Udrea, F and Curty, J-P and Dehollain, C and Declercq, M and Ionescu, AM (2004) High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining. Microelectronic Engineering, 73-74. pp. 447-451. ISSN 0167-9317

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:52
Last Modified: 10 Mar 2014 16:33
DOI:

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