Fritschi, R and Frédérico, S and Hibert, C and Flückiger, P and Renaud, P and Tsamados, D and Boussey, J and Chovet, A and Ng, RKM and Udrea, F and Curty, J-P and Dehollain, C and Declercq, M and Ionescu, AM (2004) High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining. Microelectronic Engineering, 73-74. pp. 447-451. ISSN 0167-9317
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | Div B > Electronics, Power & Energy Conversion |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:36 |
| Last Modified: | 20 May 2013 01:36 |
| DOI: |
Actions (login required)
| View Item |
