Saifullah, MSM and Khan, MZR and Hasko, DG and Leong, ESP and Neo, XL and Goh, ETL and Anderson, D and Jones, GAC and Welland, ME (2010) Spin-coatable HfO2 resist for optical and electron beam lithographies. J VAC SCI TECHNOL B, 28. pp. 90-95. ISSN 1071-1023
Full text not available from this repository.Item Type: | Article |
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Uncontrolled Keywords: | electron resists etching field effect transistors Fourier transform spectra hafnium compounds infrared spectra leakage currents masks photolithography silicon-on-insulator sol-gel processing spin coating CHEMICAL-VAPOR-DEPOSITION OXIDE MOSFET NANOLITHOGRAPHY DIELECTRICS SI(100) FILMS |
Subjects: | UNSPECIFIED |
Divisions: | Div B > Solid State Electronics and Nanoscale Science |
Depositing User: | Cron Job |
Date Deposited: | 17 Jul 2017 19:18 |
Last Modified: | 10 Apr 2021 22:49 |
DOI: | 10.1116/1.3273536 |