Saifullah, MSM and Khan, MZR and Hasko, DG and Leong, ESP and Neo, XL and Goh, ETL and Anderson, D and Jones, GAC and Welland, ME (2010) Spin-coatable HfO2 resist for optical and electron beam lithographies. J VAC SCI TECHNOL B, 28. pp. 90-95. ISSN 1071-1023
Full text not available from this repository.
|Item Type: ||Article|
|Uncontrolled Keywords: ||electron resists etching field effect transistors Fourier transform spectra hafnium compounds infrared spectra leakage currents masks photolithography silicon-on-insulator sol-gel processing spin coating CHEMICAL-VAPOR-DEPOSITION OXIDE MOSFET NANOLITHOGRAPHY DIELECTRICS SI(100) FILMS|
|Depositing User: ||Cron Job|
|Date Deposited: ||04 Nov 2011 16:14|
|Last Modified: ||20 May 2013 01:33|
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