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Spin-coatable HfO2 resist for optical and electron beam lithographies

Saifullah, MSM and Khan, MZR and Hasko, DG and Leong, ESP and Neo, XL and Goh, ETL and Anderson, D and Jones, GAC and Welland, ME (2010) Spin-coatable HfO2 resist for optical and electron beam lithographies. J VAC SCI TECHNOL B, 28. pp. 90-95. ISSN 1071-1023

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Item Type: Article
Uncontrolled Keywords: electron resists etching field effect transistors Fourier transform spectra hafnium compounds infrared spectra leakage currents masks photolithography silicon-on-insulator sol-gel processing spin coating CHEMICAL-VAPOR-DEPOSITION OXIDE MOSFET NANOLITHOGRAPHY DIELECTRICS SI(100) FILMS
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:43
Last Modified: 13 Oct 2014 01:18
DOI: 10.1116/1.3273536

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