Saifullah, MSM and Khan, MZR and Hasko, DG and Leong, ESP and Neo, XL and Goh, ETL and Anderson, D and Jones, GAC and Welland, ME (2010) Spin-coatable HfO2 resist for optical and electron beam lithographies. J VAC SCI TECHNOL B, 28. pp. 90-95. ISSN 1071-1023
Full text not available from this repository.
| Item Type: | Article |
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| Uncontrolled Keywords: | electron resists etching field effect transistors Fourier transform spectra hafnium compounds infrared spectra leakage currents masks photolithography silicon-on-insulator sol-gel processing spin coating CHEMICAL-VAPOR-DEPOSITION OXIDE MOSFET NANOLITHOGRAPHY DIELECTRICS SI(100) FILMS |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 04 Nov 2011 16:14 |
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| Last Modified: | 20 May 2013 01:33 |
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| DOI: | 10.1116/1.3273536 |
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