Saifullah, MSM and Khan, MZR and Hasko, DG and Leong, ESP and Neo, XL and Goh, ETL and Anderson, D and Jones, GAC and Welland, ME (2010) Spin-coatable HfO2 resist for optical and electron beam lithographies. J VAC SCI TECHNOL B, 28. pp. 90-95. ISSN 1071-1023
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | electron resists etching field effect transistors Fourier transform spectra hafnium compounds infrared spectra leakage currents masks photolithography silicon-on-insulator sol-gel processing spin coating CHEMICAL-VAPOR-DEPOSITION OXIDE MOSFET NANOLITHOGRAPHY DIELECTRICS SI(100) FILMS |
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron job |
| Date Deposited: | 04 Feb 2015 22:26 |
| Last Modified: | 05 Feb 2015 00:37 |
| DOI: | 10.1116/1.3273536 |
