Saifullah, MSM and Subramanian, KRV and Anderson, D and Kang, DJ and Huck, WTS and Jones, GAC and Welland, ME (2006) Sub-10-nm high aspect ratio patterning of ZnO in a 500 mu m main field. J VAC SCI TECHNOL B, 24. pp. 1215-1218. ISSN 1071-1023
Full text not available from this repository.
| Item Type: | Article |
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| Uncontrolled Keywords: | ELECTRON-BEAM NANOLITHOGRAPHY FABRICATION LITHOGRAPHY RESISTS LINES |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 04 Nov 2011 15:47 |
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| Last Modified: | 20 May 2013 01:33 |
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| DOI: | 10.1116/1.2192545 |
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