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Sub-10-nm high aspect ratio patterning of ZnO in a 500 mu m main field

Saifullah, MSM and Subramanian, KRV and Anderson, D and Kang, DJ and Huck, WTS and Jones, GAC and Welland, ME (2006) Sub-10-nm high aspect ratio patterning of ZnO in a 500 mu m main field. J VAC SCI TECHNOL B, 24. pp. 1215-1218. ISSN 1071-1023

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Item Type: Article
Uncontrolled Keywords: ELECTRON-BEAM NANOLITHOGRAPHY FABRICATION LITHOGRAPHY RESISTS LINES
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:43
Last Modified: 11 Aug 2014 01:09
DOI: 10.1116/1.2192545

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