Saifullah, MSM and Subramanian, KRV and Anderson, D and Kang, DJ and Huck, WTS and Jones, GAC and Welland, ME (2006) Sub-10-nm high aspect ratio patterning of ZnO in a 500 mu m main field. J VAC SCI TECHNOL B, 24. pp. 1215-1218. ISSN 1071-1023
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|Item Type: ||Article|
|Uncontrolled Keywords: ||ELECTRON-BEAM NANOLITHOGRAPHY FABRICATION LITHOGRAPHY RESISTS LINES|
|Depositing User: ||Cron Job|
|Date Deposited: ||04 Nov 2011 15:47|
|Last Modified: ||20 May 2013 01:33|
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