CUED Publications database

High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

Morrison, NA and Rodil, SE and Ferrari, AC and Robertson, J and Milne, WI (1999) High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source. Thin Solid Films, 337. pp. 71-73. ISSN 0040-6090

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:42
Last Modified: 06 Oct 2014 01:23
DOI: