Morrison, NA and Muhl, S and Rodil, SE and Milne, WI and Robertson, J and Weiler, M and Wang, PZ and Hutchings, I and Stolojan, V and Brown, LM (1997) High rate deposition of Ta-C:H using an electron cyclotron wave resonance plasma source. Materials Research Society Symposium - Proceedings, 498. pp. 147-152. ISSN 0272-9172
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | Div E > Production Processes |
| Depositing User: | Cron Job |
| Date Deposited: | 14 Dec 2011 15:10 |
| Last Modified: | 25 Mar 2013 01:15 |
| DOI: |
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