CUED Publications database

High rate deposition of Ta-C:H using an electron cyclotron wave resonance plasma source

Morrison, NA and Muhl, S and Rodil, SE and Milne, WI and Robertson, J and Weiler, M and Wang, PZ and Hutchings, I and Stolojan, V and Brown, LM (1997) High rate deposition of Ta-C:H using an electron cyclotron wave resonance plasma source. Materials Research Society Symposium - Proceedings, 498. pp. 147-152. ISSN 0272-9172

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div E > Production Processes
Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:04
Last Modified: 18 Jul 2017 09:41
DOI: