CUED Publications database

Material properties and tribological performance of rf-PECVD deposited DLC coatings

Clay, KJ and Speakman, SP and Morrison, NA and Tomozeiu, N and Milne, WI and Kapoor, A (1998) Material properties and tribological performance of rf-PECVD deposited DLC coatings. Diamond and Related Materials, 7. pp. 1100-1107. ISSN 0925-9635

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Abstract

Diamond-like carbon (DLC) coatings were deposited on to silicon, glass and metal substrates, using an rf-plasma enhanced chemical vapour deposition (rf-PECVD) process. The resultant film properties were evaluated in respect of material and interfacial property control, based on bias voltage variation and the introduction of inert (He and Ar) and reactive (N2) diluting gases in a CH4 plasma. The analysis techniques used to assess the material properties of the films included AFM, EELS, RBS/ERDA, spectroscopic, electrical, stress, microhardness, and adhesion. These were correlated to the tribological performance of the coatings using wear measurements. The most important observation is that He dilution (>90%) promotes enhanced adhesion with respect to all substrate material studies. Coatings typically exhibit a microhardness of the order of 10-20 GPa in films 0.1<d<2 μm thick, with associated electrical resistivity in the range 108<ρ<1012Ω.cm, coefficient of fricton <0.1 and surface RMS roughness as low as 2Å. The results are discussed with respect to surface pre-treatment, ion surface bombardment, interfacial reactivity and changes in plasma gas breakdown processes.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:24
Last Modified: 08 Dec 2014 02:12
DOI: 10.1016/S0925-9635(98)00159-9