CUED Publications database

Material properties and tribological performance of rf-PECVD deposited DLC coatings

Clay, KJ and Speakman, SP and Morrison, NA and Tomozeiu, N and Milne, WI and Kapoor, A (1998) Material properties and tribological performance of rf-PECVD deposited DLC coatings. Diamond and Related Materials, 7. pp. 1100-1107. ISSN 0925-9635

Full text not available from this repository.


Diamond-like carbon (DLC) coatings were deposited on to silicon, glass and metal substrates, using an rf-plasma enhanced chemical vapour deposition (rf-PECVD) process. The resultant film properties were evaluated in respect of material and interfacial property control, based on bias voltage variation and the introduction of inert (He and Ar) and reactive (N 2 ) diluting gases in a CH 4 plasma. The analysis techniques used to assess the material properties of the films included AFM, EELS, RBS/ERDA, spectroscopic, electrical, stress, microhardness, and adhesion. These were correlated to the tribological performance of the coatings using wear measurements. The most important observation is that He dilution ( > 90%) promotes enhanced adhesion with respect to all substrate material studies. Coatings typically exhibit a microhardness of the order of 10-20 GPa in films 0.1 < d < 2 μm thick, with associated electrical resistivity in the range 10 8 < ρ < 10 12 Ω.cm, coefficient of fricton < 0.1 and surface RMS roughness as low as 2Å. The results are discussed with respect to surface pre-treatment, ion surface bombardment, interfacial reactivity and changes in plasma gas breakdown processes.

Item Type: Article
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:12
Last Modified: 28 Dec 2017 01:49