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Properties of amorphous carbon-silicon alloys deposited by a high plasma density source

Racine, B and Ferrari, AC and Morrison, NA and Hutchings, I and Milne, WI and Robertson, J (2001) Properties of amorphous carbon-silicon alloys deposited by a high plasma density source. Journal of Applied Physics, 90. pp. 5002-5012. ISSN 0021-8979

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div E > Production Processes
Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:40
Last Modified: 24 Mar 2014 01:13
DOI:

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