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Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma

Morrison, NA and William, C and Racine, B and Milne, WI and Martinez, E and Esteve, J and Andujar, JL (2003) Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma. Current Applied Physics, 3. pp. 433-437. ISSN 1567-1739

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:40
Last Modified: 16 Jun 2014 01:11
DOI:

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