CUED Publications database

Methane chemistry involved in a low-pressure electron cyclotron wave resonant plasma discharg

Morrison, NA and William, C and Milne, WI (2003) Methane chemistry involved in a low-pressure electron cyclotron wave resonant plasma discharg. Journal of Applied Physics, 94. pp. 7031-7043. ISSN 0021-8979

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Abstract

A low-pressure methane plasma generated by electron cyclotron wave resonance was characterized in terms of electron temperature, plasma density and composition. Methane plasmas were commonly used in the deposition of hydrogenated amorphous carbon thin films. Little variation in the plasma chemistry was observed by mass spectrometry measurements of the gas phase with increasing electron temperature. The results show that direct electron-impact reactions exert greater influence on the plasma chemistry than secondary ion-neutral reactions.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:40
Last Modified: 12 Dec 2014 19:04
DOI: 10.1063/1.1621711