Morrison, NA and William, C and Milne, WI (2003) Methane chemistry involved in a low-pressure electron cyclotron wave resonant plasma discharg. Journal of Applied Physics, 94. pp. 7031-7043. ISSN 0021-8979Full text not available from this repository.
A low-pressure methane plasma generated by electron cyclotron wave resonance was characterized in terms of electron temperature, plasma density and composition. Methane plasmas were commonly used in the deposition of hydrogenated amorphous carbon thin films. Little variation in the plasma chemistry was observed by mass spectrometry measurements of the gas phase with increasing electron temperature. The results show that direct electron-impact reactions exert greater influence on the plasma chemistry than secondary ion-neutral reactions.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
|Depositing User:||Cron Job|
|Date Deposited:||15 Dec 2015 12:41|
|Last Modified:||10 Feb 2016 03:12|