Hofmann, S and Kleinsorge, B and Ducati, C and Robertson, J (2003) Controlled low-temperature growth of carbon nanofibres by plasma deposition. New Journal of Physics, 5. ISSN 1367-2630Full text not available from this repository.
Vertically aligned carbon nanofibres were grown at temperatures as low as 120degreesC by plasma-enhanced chemical vapour deposition (PECVD). A systematic study of the temperature dependence of the growth rate found an activation energy of 0.23 eV, much less than that for thermal chemical vapour deposition (1.2-1.5 eV). This suggests that growth occurs by surface diffusion of carbon on nickel. Vertically aligned carbon nanofibres were grown by PECVD on to flexible plastic substrates. We show that individual lines and dots of free-standing 20-50 nm diameter nanotubes can be grown on to chromium-covered polyimide foil. The scalable deposition method allows large-area coverage without damaging or bending the sensitive substrate material. Field-emission cathodes were made for the purpose of demonstration.
|Additional Information:||Nov 17 Controlled low-temperature growth of carbon nanofibres by plasma deposition 745DC Times Cited:6 Cited References Count:47 English|
|Uncontrolled Keywords:||CHEMICAL-VAPOR-DEPOSITION nanotubes arrays electrodes field-emission patterned growth transistors polyimide large-scale synthesis metal nanoparticles|
|Depositing User:||Cron Job|
|Date Deposited:||04 Nov 2011 15:46|
|Last Modified:||20 May 2013 01:32|
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