Teo, KBK and Lee, S-B and Chhowalla, M and Semet, V and Binh, VT and Groening, O and Castignolles, M and Loiseau, A and Pirio, G and Legagneux, P and Pribat, D and Hasko, DG and Ahmed, H and Amaratunga, GAJ and Milne, WI (2003) Plasma enhanced chemical vapour deposition carbon nanotubes/nanofibres - How uniform do they grow? Nanotechnology, 14. pp. 204-211. ISSN 0957-4484Full text not available from this repository.
The ability to grow carbon nanotubes/nanofibres (CNs) with a high degree of uniformity is desirable in many applications. In this paper, the structural uniformity of CNs produced by plasma enhanced chemical vapour deposition is evaluated for field emission applications. When single isolated CNs were deposited using this technology, the structures exhibited remarkable uniformity in terms of diameter and height (standard deviations were 4.1 and 6.3% respectively of the average diameter and height). The lithographic conditions to achieve a high yield of single CNs are also discussed. Using the height and diameter uniformity statistics, we show that it is indeed possible to accurately predict the average field enhancement factor and the distribution of enhancement factors of the structures, which was confirmed by electrical emission measurements on individual CNs in an array.
|Depositing User:||Cron job|
|Date Deposited:||04 Feb 2015 22:37|
|Last Modified:||05 Feb 2015 00:51|