CUED Publications database

Fabrication of 25nm wide gold lines using nanometer scale lithography and ionized cluster beam deposition

Huq, SE and Chen, ZW and McMahon, RA and Jones, GAC and Ahmed, H (1990) Fabrication of 25nm wide gold lines using nanometer scale lithography and ionized cluster beam deposition. Microelectronic Engineering, 11. pp. 343-346. ISSN 0167-9317

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Abstract

It becomes increasingly difficult to make continuous metal lines with well defined thickness and edges by the lift-off technique as the line width is decreased. We describe in this paper a technique in which the combination of high resolution electron beam lithography and ionized cluster beam (ICB) deposition has enabled very high quality gold lines ({all equal to}25nm wide) to be obtained on thick single crystal silicon substrates. © 1990.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Electronics, Power & Energy Conversion
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 02 Sep 2016 17:07
Last Modified: 27 Sep 2016 22:35
DOI: