Choi, Y and Ducati, C and Fu, Y-Q and Speakman, SP and Flewitt, AJ (2007) Hafnium oxide deposited at room temperature by reactive rf magnetron sputtering from a metallic target for thin film transistors. In: International Thin Film Transistor Conference, 3-1-2007 to --, Rome, Italy.
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|Item Type: ||Conference or Workshop Item (UNSPECIFIED)|
|Additional Information: ||Event type = conference|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 17:04|
|Last Modified: ||13 Feb 2012 01:30|
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