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Hafnium oxide deposited at room temperature by reactive rf magnetron sputtering from a metallic target for thin film transistors

Choi, Y and Ducati, C and Fu, Y-Q and Speakman, SP and Flewitt, AJ (2007) Hafnium oxide deposited at room temperature by reactive rf magnetron sputtering from a metallic target for thin film transistors. In: International Thin Film Transistor Conference, 2007-1-3 to --, Rome, Italy.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 02 Sep 2016 17:49
Last Modified: 26 Sep 2016 10:54
DOI: