Choi, Y and Ducati, C and Fu, Y-Q and Speakman, SP and Flewitt, AJ (2007) Hafnium oxide deposited at room temperature by reactive rf magnetron sputtering from a metallic target for thin film transistors. In: International Thin Film Transistor Conference, 3-1-2007 to --, Rome, Italy.
Full text not available from this repository.
| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
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| Additional Information: | Event type = conference |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 28 Oct 2011 17:04 |
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| Last Modified: | 13 Feb 2012 01:30 |
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| DOI: | |
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