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Hafnium oxide deposited at room temperature by reactive rf magnetron sputtering from a metallic target for thin film transistors

Choi, Y and Ducati, C and Fu, YQ and Speakman, SP and Flewitt, AJ (2007) Hafnium oxide deposited at room temperature by reactive rf magnetron sputtering from a metallic target for thin film transistors. In: International Thin Film Transistor Conference, 2007-1-3 to --, Rome, Italy.

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Item Type: Conference or Workshop Item (UNSPECIFIED)
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Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 16 Jul 2015 13:36
Last Modified: 01 Aug 2015 22:06
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