Sutcliffe, MPF and Liu, F (2006) Development of a process map for low-k materials. In: 16th CMP Users Meeting, Semicon Europa, 7-4-2006 to --, Munich, Germany.
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|Item Type: ||Conference or Workshop Item (UNSPECIFIED)|
|Additional Information: ||Event type = conference 16th CMP (Chemical Mechanical Polishing) Users Meeting was held at Semicon Europa 2006, SEMICON 2006 30th Anniversary event, held 4-6 April 2006 in Munich, Germany. http://www.semiconeuropa.org/Facts/2006/000958|
|Divisions: ||Div C > Materials Engineering|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:36|
|Last Modified: ||24 Dec 2012 01:02|
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