CUED Publications database

Surface diffusion of SiH3 radicals and growth mechanism of a-Si:H and uc-Si

Dewarrat, R and Robertson, J (2002) Surface diffusion of SiH3 radicals and growth mechanism of a-Si:H and uc-Si. In: Amorphous and Heterogeneous Silicon-Based Films, 2002-4-1 to 2002-4-5, San Francisco, CA, USA pp. 15-20..

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:58
Last Modified: 17 Mar 2014 15:01
DOI: