Robertson, J and Peacock, PW (2002) Atomic structure, band offset engineering, and hydrogen at High-K oxide: Si interfaces. In: Symposium on Interfacial Issues for Oxide-Based Electronics, 1-12-2002 to 4-12-2002, Boston, MA, USA pp. 99-112..
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|Item Type: ||Conference or Workshop Item (UNSPECIFIED)|
|Additional Information: ||Event type = other|
|Divisions: ||Div B > Electronics, Power & Energy Conversion|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:57|
|Last Modified: ||23 Jan 2012 01:46|
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