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Thermodynamic model of the role of Hydrogen dilution in plasma deposition of microcrystalline silicon

Robertson, J (2001) Thermodynamic model of the role of Hydrogen dilution in plasma deposition of microcrystalline silicon. In: Amorphous and Heterogeneous Silicon-Based Films, Symposium A, Materials Research Society Spring Meeting 2001, 2001-4- to --, San Francisco, CA, USA A1.5-..

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Item Type: Conference or Workshop Item (UNSPECIFIED)
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 12:40
Last Modified: 17 Mar 2014 15:01
DOI:

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