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Characterisation of ionised magnetron sputtering plasmas for thin film deposition

Christou, C and Kusano, Y and Chiu, KF and Hutchings, IM and Barber, ZH (1999) Characterisation of ionised magnetron sputtering plasmas for thin film deposition. In: International Conference on Phenomena in Ionized Gases, 11-7-1999 to 16-7-1999, Warsaw, Poland pp. 35-36..

Full text not available from this repository.
Item Type: Conference or Workshop Item (UNSPECIFIED)
Additional Information: Event type = conference
Subjects: UNSPECIFIED
Divisions: Div E > Production Processes
Depositing User: Cron Job
Date Deposited: 28 Oct 2011 16:23
Last Modified: 11 Mar 2013 02:03
DOI:

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