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Scanning tunneling microscopy study of the growth mechanism for hydrogenated amorphous Silicon produced by plasma enhanced chemical vapor deposition

Flewitt, AJ and Milne, WI and Robertson, J and Stephenson, AW (1998) Scanning tunneling microscopy study of the growth mechanism for hydrogenated amorphous Silicon produced by plasma enhanced chemical vapor deposition. In: The MRS Symposium on Amorphous and Microcrystalline Silicon Technology, 1998-4- to --, San Francisco, CA, US pp. 571-576..

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Date Deposited: 16 Jul 2015 13:15
Last Modified: 27 Aug 2015 21:20
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