Morrison, NA and Muhl, S and Rodil, SE and Milne, WI and Robertson, J and Weiler, M and Wang, PZ and Hutchings, I and Stolojan, V and Brown, LM (1998) High rate deposition of ta-C : H using an electron cyclotron wave resonance plasma source. In: Covalently Bonded Disordered Thin-Film Materials. Materials Research Society Symposium Proceedings, 498 . Materials Research Society, pp. 147-152. ISBN 1558994033
Full text not available from this repository.
| Item Type: | Book Section |
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| Additional Information: | Symposium on Covalently Bonded Disordered Thin-Film Materials, at the 1997 MRS Fall Meeting DEC 02-04, 1997 BOSTON, MASSACHUSETTS |
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| Subjects: | UNSPECIFIED |
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| Divisions: | Div E > Production Processes |
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| Depositing User: | Cron Job |
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| Date Deposited: | 28 Oct 2011 16:23 |
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| Last Modified: | 09 Jul 2012 01:02 |
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| DOI: | |
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