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High rate deposition of ta-C : H using an electron cyclotron wave resonance plasma source

Morrison, NA and Muhl, S and Rodil, SE and Milne, WI and Robertson, J and Weiler, M and Wang, PZ and Hutchings, I and Stolojan, V and Brown, LM (1998) High rate deposition of ta-C : H using an electron cyclotron wave resonance plasma source. In: Covalently Bonded Disordered Thin-Film Materials. Materials Research Society Symposium Proceedings, 498 . Materials Research Society, pp. 147-152.

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Item Type: Book Section
Subjects: UNSPECIFIED
Divisions: Div E > Production Processes
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 12:33
Last Modified: 10 Mar 2014 17:38
DOI: