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Spatially resolved characterization of the Si/SiO2 system using conducting atomic force microscopy

Murrell, MP and Welland, ME and Wong, TMH (1993) Spatially resolved characterization of the Si/SiO2 system using conducting atomic force microscopy. In: The 25th International Conference on Solid State Devices and Materials (SSDM 1993), 1993-8- to -- pp. 92-94..

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Item Type: Conference or Workshop Item (UNSPECIFIED)
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Depositing User: Cron job
Date Deposited: 04 Feb 2015 23:57
Last Modified: 05 Feb 2015 02:20
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