Murrell, MP and Welland, ME and Wong, TMH (1993) Spatially resolved characterization of the Si/SiO2 system using conducting atomic force microscopy. In: The 25th International Conference on Solid State Devices and Materials (SSDM 1993), -8-1993 to -- pp. 92-94..
Full text not available from this repository.
| Item Type: | Conference or Workshop Item (UNSPECIFIED) |
|---|
| Additional Information: | Event type = conference Conference held in Chiba; Japan, August 1993. Conference item published as a book section. |
|---|
| Subjects: | UNSPECIFIED |
|---|
| Divisions: | UNSPECIFIED |
|---|
| Depositing User: | Cron Job |
|---|
| Date Deposited: | 28 Oct 2011 16:51 |
|---|
| Last Modified: | 15 Nov 2011 10:20 |
|---|
| DOI: | |
|---|
Actions (login required)
