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Spatially resolved characterization of the Si/SiO2 system using conducting atomic force microscopy

Murrell, MP and Welland, ME and Wong, TMH (1993) Spatially resolved characterization of the Si/SiO2 system using conducting atomic force microscopy. In: The 25th International Conference on Solid State Devices and Materials (SSDM 1993), 1993-8- to -- pp. 92-94..

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Date Deposited: 16 Jul 2015 14:57
Last Modified: 28 Jul 2015 22:11
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