Fu, YQ and Colli, A and Fasoli, A and Luo, JK and Flewitt, AJ and Ferrari, AC and Milne, WI (2009) Deep reactive ion etching as a tool for nanostructure fabrication. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 27. pp. 1520-1526. ISSN 1071-1023
Full text not available from this repository.
| Item Type: | Article |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 28 Oct 2011 16:49 |
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| Last Modified: | 14 May 2013 19:01 |
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| DOI: | 10.1116/1.3065991 |
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