Fu, YQ and Colli, A and Fasoli, A and Luo, JK and Flewitt, AJ and Ferrari, AC and Milne, WI (2009) Deep reactive ion etching as a tool for nanostructure fabrication. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 27. pp. 1520-1526. ISSN 1071-1023
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|Item Type: ||Article|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:49|
|Last Modified: ||30 Dec 2013 01:18|
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