O'Neill, W and Li, K (2009) High-quality micromachining of silicon at 1064 nm using a high-brightness MOPA-based 20-W Yb fiber laser. IEEE Journal of Selected Topics in Quantum Electronics, 15. pp. 462-470. ISSN 1077-260XFull text not available from this repository.
|Divisions:||Div E > Production Processes|
Div B > Photonics
|Depositing User:||Unnamed user with email firstname.lastname@example.org|
|Date Deposited:||18 May 2016 17:51|
|Last Modified:||25 Aug 2016 04:20|