O'Neill, W and Li, K (2009) High-quality micromachining of silicon at 1064 nm using a high-brightness MOPA-based 20-W Yb fiber laser. IEEE Journal of Selected Topics in Quantum Electronics, 15. pp. 462-470. ISSN 1077-260X
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Additional Information: | Related urls = http://dx.doi.org/10.1109/JSTQE.2009.2012269 |
| Subjects: | UNSPECIFIED |
| Divisions: | Div E > Production Processes Div B > Photonics |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:49 |
| Last Modified: | 20 May 2013 01:32 |
| DOI: | 10.1109/JSTQE.2009.2012269 |
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