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High-quality micromachining of silicon at 1064 nm using a high-brightness MOPA-based 20-W Yb fiber laser

O'Neill, W and Li, K (2009) High-quality micromachining of silicon at 1064 nm using a high-brightness MOPA-based 20-W Yb fiber laser. IEEE Journal of Selected Topics in Quantum Electronics, 15. pp. 462-470. ISSN 1077-260X

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div E > Production Processes
Div B > Photonics
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 18 May 2016 17:51
Last Modified: 25 Aug 2016 04:20
DOI: