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High-quality micromachining of silicon at 1064 nm using a high-brightness MOPA-based 20-W Yb fiber laser

O'Neill, W and Li, K (2009) High-quality micromachining of silicon at 1064 nm using a high-brightness MOPA-based 20-W Yb fiber laser. IEEE Journal of Selected Topics in Quantum Electronics, 15. pp. 462-470. ISSN 1077-260X

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div E > Production Processes
Div B > Photonics
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:05
Last Modified: 19 Jun 2015 11:30
DOI: 10.1109/JSTQE.2009.2012269