Liu, F and Sutcliffe, MPF (2007) Modelling of delamination of ultra low-k material during chemical mechanical polishing. Tribology Letters, 25. pp. 225-236. ISSN 1023-8883
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | Div C > Materials Engineering |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:36 |
| Last Modified: | 20 May 2013 01:36 |
| DOI: | 10.1007/s11249-006-9171-z |
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