Milne, SB and Fu, YQ and Luo, JK and Flewitt, AJ and Pisana, S and Fasoli, A and Milne, WI (2007) Stress and crystallization of plasma enhanced chemical vapour deposition nanocrystalline silicon films. Journal of Nanoscience and Nanotechnology, 8. pp. 2693-2698. ISSN 1533-4880Full text not available from this repository.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
|Depositing User:||Unnamed user with email firstname.lastname@example.org|
|Date Deposited:||18 May 2016 17:52|
|Last Modified:||24 Jul 2016 22:21|