CUED Publications database

Stress and crystallization of plasma enhanced chemical vapour deposition nanocrystalline silicon films

Milne, SB and Fu, YQ and Luo, JK and Flewitt, AJ and Pisana, S and Fasoli, A and Milne, WI (2007) Stress and crystallization of plasma enhanced chemical vapour deposition nanocrystalline silicon films. Journal of Nanoscience and Nanotechnology, 8. pp. 2693-2698. ISSN 1533-4880

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 15 Dec 2015 12:44
Last Modified: 30 Apr 2016 03:58
DOI: