Tse, K and Robertson, J (2006) Defect passivation in HfO2 gate oxide by fluorine. Applied Physics Letters, 89. 142914-. ISSN 0003-6951
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:47 |
| Last Modified: | 27 May 2013 01:22 |
| DOI: | 10.1063/1.2360190 |
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