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Defect passivation in HfO2 gate oxide by fluorine

Tse, K and Robertson, J (2006) Defect passivation in HfO2 gate oxide by fluorine. Applied Physics Letters, 89. 142914-. ISSN 0003-6951

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 18 May 2016 17:59
Last Modified: 28 Aug 2016 22:19
DOI: