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Defect passivation in HfO2 gate oxide by fluorine

Tse, K and Robertson, J (2006) Defect passivation in HfO2 gate oxide by fluorine. Applied Physics Letters, 89. 142914-. ISSN 0003-6951

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 16 Jul 2015 13:32
Last Modified: 02 Sep 2015 02:13
DOI: 10.1063/1.2360190