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Defect passivation in HfO2 gate oxide by fluorine

Tse, K and Robertson, J (2006) Defect passivation in HfO2 gate oxide by fluorine. Applied Physics Letters, 89. 142914-. ISSN 0003-6951

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:28
Last Modified: 24 Mar 2014 01:13
DOI: 10.1063/1.2360190

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