Fu, YQ and Luo, JK and Milne, SB and Flewitt, AJ and Milne, WI (2005) Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution. Materials Science and Engineering B: Solid–State Materials for Advanced Technology. pp. 132-137. ISSN 0921-5107Full text not available from this repository.
|Depositing User:||Cron job|
|Date Deposited:||04 Feb 2015 22:43|
|Last Modified:||02 Apr 2015 01:41|