CUED Publications database

Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution

Fu, YQ and Luo, JK and Milne, SB and Flewitt, AJ and Milne, WI (2005) Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution. Materials Science and Engineering B: Solid–State Materials for Advanced Technology. pp. 132-137. ISSN 0921-5107

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:21
Last Modified: 06 Oct 2014 01:23
DOI: 10.1016/j.mseb.2005.08.104