Fu, YQ and Luo, JK and Milne, SB and Flewitt, AJ and Milne, WI (2005) Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution. Materials Science and Engineering B: Solid–State Materials for Advanced Technology. pp. 132-137. ISSN 0921-5107
Full text not available from this repository.
|Item Type: ||Article|
|Additional Information: ||This journal contains the proceedings of EMRS 2005, Symposium D - Materials Science and Device Issues for Future Technologies. Edited by L. Pelaz, R. Duffy, F. Cristiano, B. Colombeau and S. Uppal.|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:46|
|Last Modified: ||27 May 2013 01:24|
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