CUED Publications database

Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution

Fu, YQ and Luo, JK and Milne, SB and Flewitt, AJ and Milne, WI (2005) Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution. Materials Science and Engineering B: Solid–State Materials for Advanced Technology. pp. 132-137. ISSN 0921-5107

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 15 Dec 2015 13:10
Last Modified: 13 Feb 2016 00:00
DOI: 10.1016/j.mseb.2005.08.104