Fu, YQ and Luo, JK and Milne, SB and Flewitt, AJ and Milne, WI (2005) Residual stress in amorphous and nanocrystalline Si films prepared by PECVD with hydrogen dilution. Materials Science and Engineering B: Solid–State Materials for Advanced Technology. pp. 132-137. ISSN 0921-5107Full text not available from this repository.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
|Depositing User:||Cron Job|
|Date Deposited:||18 May 2016 17:59|
|Last Modified:||25 Jul 2016 02:13|