Xiong, K and Robertson, J (2005) Point defects in HfO2 high K gate oxide. Microelectronic Engineering, 80. pp. 408-411. ISSN 0167-9317
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|Item Type: ||Article|
|Additional Information: ||This journal contains the proceedings of the 14th biennial Conference on Insulating Films on Semiconductors, 22-24 June 2005, and is edited by G. Groeseneken and B. Kaczer|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:46|
|Last Modified: ||20 May 2013 01:36|
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