CUED Publications database

Point defects in HfO2 high K gate oxide

Xiong, K and Robertson, J (2005) Point defects in HfO2 high K gate oxide. Microelectronic Engineering, 80. pp. 408-411. ISSN 0167-9317

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 18 May 2016 17:50
Last Modified: 25 Aug 2016 09:44
DOI: