Xiong, K and Robertson, J (2005) Point defects in HfO2 high K gate oxide. Microelectronic Engineering, 80. pp. 408-411. ISSN 0167-9317
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| Item Type: | Article |
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| Additional Information: | This journal contains the proceedings of the 14th biennial Conference on Insulating Films on Semiconductors, 22-24 June 2005, and is edited by G. Groeseneken and B. Kaczer |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 28 Oct 2011 16:46 |
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| Last Modified: | 20 May 2013 01:36 |
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| DOI: | 10.1016/j.mee.2005.04.098 |
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