CUED Publications database

Point defects in HfO2 high K gate oxide

Xiong, K and Robertson, J (2005) Point defects in HfO2 high K gate oxide. Microelectronic Engineering, 80. pp. 408-411. ISSN 0167-9317

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:17
Last Modified: 01 May 2015 18:59
DOI: 10.1016/j.mee.2005.04.098