CUED Publications database

Point defects in HfO2 high K gate oxide

Xiong, K and Robertson, J (2005) Point defects in HfO2 high K gate oxide. Microelectronic Engineering, 80. pp. 408-411. ISSN 0167-9317

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 15 Dec 2015 13:24
Last Modified: 13 Feb 2016 21:33
DOI: 10.1016/j.mee.2005.04.098