Xiong, K and Peacock, PW and Robertson, J (2005) Fermi level pinning and Hf-Si bonds at HfO2: Polycrystalline silicon gate electrode interfaces. Applied Physics Letters, 86. 012904-. ISSN 0003-6951
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | Div B > Electronics, Power & Energy Conversion |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:46 |
| Last Modified: | 27 May 2013 01:22 |
| DOI: | 10.1063/1.1844611 |
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