CUED Publications database

Fermi level pinning and Hf-Si bonds at HfO2: Polycrystalline silicon gate electrode interfaces

Xiong, K and Peacock, PW and Robertson, J (2005) Fermi level pinning and Hf-Si bonds at HfO2: Polycrystalline silicon gate electrode interfaces. Applied Physics Letters, 86. 012904-. ISSN 0003-6951

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:15
Last Modified: 26 Mar 2015 01:42
DOI: 10.1063/1.1844611