CUED Publications database

Low-temperature deposition of hydrogenated amorphous silicon in an electron cyclotron resonance reactor for flexible displays

Flewitt, AJ and Milne, WI (2005) Low-temperature deposition of hydrogenated amorphous silicon in an electron cyclotron resonance reactor for flexible displays. Procceedings, IEEE: Flexible Electronics Technology, Part 1: Systems and Applications, 93. pp. 1364-1373. ISSN 0018-9219

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 02 Sep 2016 16:29
Last Modified: 28 Sep 2016 03:09
DOI: