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Low-temperature deposition of hydrogenated amorphous silicon in an electron cyclotron resonance reactor for flexible displays

Flewitt, AJ and Milne, WI (2005) Low-temperature deposition of hydrogenated amorphous silicon in an electron cyclotron resonance reactor for flexible displays. Procceedings, IEEE: Flexible Electronics Technology, Part 1: Systems and Applications, 93. pp. 1364-1373. ISSN 0018-9219

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:44
Last Modified: 06 Oct 2014 01:23
DOI:

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