Flewitt, AJ and Milne, WI (2005) Low-temperature deposition of hydrogenated amorphous silicon in an electron cyclotron resonance reactor for flexible displays. Procceedings, IEEE: Flexible Electronics Technology, Part 1: Systems and Applications, 93. pp. 1364-1373. ISSN 0018-9219
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|Item Type: ||Article|
|Additional Information: ||This journal was edited by Nathan, A.; Chalamala, B. R.|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:46|
|Last Modified: ||03 Jun 2013 01:11|
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