CUED Publications database

Low-temperature deposition of hydrogenated amorphous silicon in an electron cyclotron resonance reactor for flexible displays

Flewitt, AJ and Milne, WI (2005) Low-temperature deposition of hydrogenated amorphous silicon in an electron cyclotron resonance reactor for flexible displays. Procceedings, IEEE: Flexible Electronics Technology, Part 1: Systems and Applications, 93. pp. 1364-1373. ISSN 0018-9219

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 18 May 2016 19:08
Last Modified: 26 May 2016 06:15
DOI: