Flewitt, AJ and Milne, WI (2005) Low-temperature deposition of hydrogenated amorphous silicon in an electron cyclotron resonance reactor for flexible displays. Procceedings, IEEE: Flexible Electronics Technology, Part 1: Systems and Applications, 93. pp. 1364-1373. ISSN 0018-9219
Full text not available from this repository.
| Item Type: | Article |
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| Additional Information: | This journal was edited by Nathan, A.; Chalamala, B. R. |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 28 Oct 2011 16:46 |
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| Last Modified: | 03 Jun 2013 01:11 |
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| DOI: | |
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