Rashid, R and Flewitt, AJ and Robertson, J (2003) Physical and electrical properties of low temperature (100C) SiO2 films deposited by electron cyclotron resonance plasmas. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 21. pp. 728-739. ISSN 0734-2101
Full text not available from this repository.
| Item Type: | Article |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 28 Oct 2011 16:45 |
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| Last Modified: | 11 Mar 2013 01:56 |
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| DOI: | 10.1116/1.1562179 |
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