Rashid, R and Flewitt, AJ and Robertson, J (2003) Physical and electrical properties of low temperature (100C) SiO2 films deposited by electron cyclotron resonance plasmas. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 21. pp. 728-739. ISSN 0734-2101
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|Item Type: ||Article|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:45|
|Last Modified: ||27 May 2013 01:21|
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