Dewarrat, R and Robertson, J (2003) Surface diffusion of SiH3 radicals and growth mechanism of a-Si:H and microcrystalline Si. Thin Solid Films, 427. pp. 11-15. ISSN 0040-6090
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|Item Type: ||Article|
|Additional Information: ||Proceedings of Symposium K on Thin Film Materials for Large Area Electronics of the European Materials Research Society (E-MRS) 2002 Spring Conference, Strasbourg, France, 18 - 21 June 2002. Edited by P. Roca i Cabarrocas, G. Fortunato, J. Robertson, M. Stutzmann|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:45|
|Last Modified: ||27 May 2013 01:24|
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