Dewarrat, R and Robertson, J (2003) Surface diffusion of SiH3 radicals and growth mechanism of a-Si:H and microcrystalline Si. Thin Solid Films, 427. pp. 11-15. ISSN 0040-6090
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| Item Type: | Article |
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| Additional Information: | Proceedings of Symposium K on Thin Film Materials for Large Area Electronics of the European Materials Research Society (E-MRS) 2002 Spring Conference, Strasbourg, France, 18 - 21 June 2002. Edited by P. Roca i Cabarrocas, G. Fortunato, J. Robertson, M. Stutzmann |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 28 Oct 2011 16:45 |
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| Last Modified: | 23 May 2013 19:00 |
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| DOI: | 10.1016/S0040-6090(02)01173-2 |
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