CUED Publications database

Thermodynamic model of nucleation and growth of plasma deposited microcrystalline silicon

Robertson, J (2003) Thermodynamic model of nucleation and growth of plasma deposited microcrystalline silicon. Journal of Applied Physics, 93. pp. 731-735. ISSN 0021-8979

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 18 May 2016 18:25
Last Modified: 27 Jun 2016 07:33
DOI: 10.1063/1.1529090