Robertson, J (2003) Thermodynamic model of nucleation and growth of plasma deposited microcrystalline silicon. Journal of Applied Physics, 93. pp. 731-735. ISSN 0021-8979
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:45 |
| Last Modified: | 27 May 2013 01:21 |
| DOI: | 10.1063/1.1529090 |
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