Saifullah, MSM and Subramanian, KRV and Tapley, E and Kang, DJ and Welland, ME and Butler, M (2003) Sub-10 nm electron beam nanolithography using spin-coatable TiO2 resists. Nano Letters, 3. pp. 1587-1592. ISSN 1530-6984
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:44 |
| Last Modified: | 20 May 2013 01:40 |
| DOI: |
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