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Sub-10 nm electron beam nanolithography using spin-coatable TiO2 resists

Saifullah, MSM and Subramanian, KRV and Tapley, E and Kang, DJ and Welland, ME and Butler, M (2003) Sub-10 nm electron beam nanolithography using spin-coatable TiO2 resists. Nano Letters, 3. pp. 1587-1592. ISSN 1530-6984

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Item Type: Article
Subjects: UNSPECIFIED
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Depositing User: Cron job
Date Deposited: 16 Jul 2015 13:08
Last Modified: 03 Aug 2015 07:09
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