CUED Publications database

Sub-10 nm electron beam nanolithography using spin-coatable TiO2 resists

Saifullah, MSM and Subramanian, KRV and Tapley, E and Kang, DJ and Welland, ME and Butler, M (2003) Sub-10 nm electron beam nanolithography using spin-coatable TiO2 resists. Nano Letters, 3. pp. 1587-1592. ISSN 1530-6984

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:41
Last Modified: 26 Mar 2015 01:29
DOI: