CUED Publications database

Sub-10 nm electron beam nanolithography using spin-coatable TiO2 resists

Saifullah, MSM and Subramanian, KRV and Tapley, E and Kang, DJ and Welland, ME and Butler, M (2003) Sub-10 nm electron beam nanolithography using spin-coatable TiO2 resists. Nano Letters, 3. pp. 1587-1592. ISSN 1530-6984

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:26
Last Modified: 14 Dec 2014 06:45
DOI: