CUED Publications database

Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma

Morrison, NA and William, C and Racine, B and Milne, WI and Martinez, E and Esteve, J and Andujar, JL (2002) Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma. Current Applied Physics, 3. pp. 433-437. ISSN 1567-1739

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 16 Jul 2015 13:15
Last Modified: 29 Aug 2015 03:34
DOI: 10.1016/S1567-1739(03)00107-X