CUED Publications database

Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma

Morrison, NA and William, C and Racine, B and Milne, WI and Martinez, E and Esteve, J and Andujar, JL (2002) Properties of a-C:H films deposited from a methane electron cyclotron wave resonant plasma. Current Applied Physics, 3. pp. 433-437. ISSN 1567-1739

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 12:52
Last Modified: 17 Mar 2014 14:30
DOI: 10.1016/S1567-1739(03)00107-X

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