Weeks, BL and Vollmer, A and Welland, ME and Rayment, T (2002) High-pressure nanolithography using low-energy electrons from a scanning tunnelling microscope. Nanotechnology, 13. pp. 38-42. ISSN 0957-4484
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:44 |
| Last Modified: | 27 May 2013 01:21 |
| DOI: | 10.1088/0957-4484/13/1/308 |
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