CUED Publications database

Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system

Milne, WI and Teo, KBK and Chhowalla, M and Amaratunga, GAJ and Yuan, J and Robertson, J and Legagneax, P and Pribat, D and Bruenger, W and Trautmann, V (2001) Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system. Current Applied Physics, 1. pp. 317-320. ISSN 1567-1739

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:15
Last Modified: 04 Jun 2015 11:27
DOI: 10.1016/S1567-1739(01)00030-X