Milne, WI and Teo, KBK and Chhowalla, M and Amaratunga, GAJ and Yuan, J and Robertson, J and Legagneax, P and Pribat, D and Bruenger, W and Trautmann, V (2001) Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system. Current Applied Physics, 1. pp. 317-320. ISSN 1567-1739
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Additional Information: | Unmapped Imported Data : Event_dates = June 2002 |
| Subjects: | UNSPECIFIED |
| Divisions: | Div B > Electronics, Power & Energy Conversion |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:44 |
| Last Modified: | 16 May 2013 19:18 |
| DOI: | 10.1016/S1567-1739(01)00030-X |
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