Milne, WI and Teo, KBK and Chhowalla, M and Amaratunga, GAJ and Yuan, J and Robertson, J and Legagneax, P and Pribat, D and Bruenger, W and Trautmann, V (2001) Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system. Current Applied Physics, 1. pp. 317-320. ISSN 1567-1739Full text not available from this repository.
|Depositing User:||Cron job|
|Date Deposited:||04 Feb 2015 22:15|
|Last Modified:||05 Feb 2015 00:22|