Milne, WI and Teo, KBK and Chhowalla, M and Amaratunga, GAJ and Yuan, J and Robertson, J and Legagneax, P and Pribat, D and Bruenger, W and Trautmann, V (2001) Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system. Current Applied Physics, 1. pp. 317-320. ISSN 1567-1739Full text not available from this repository.
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