CUED Publications database

Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition

Flewitt, AJ and Dyson, AP and Robertson, J and Milne, WI (2001) Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition. Thin Solid Films, 383. pp. 172-177. ISSN 0040-6090

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:28
Last Modified: 23 Nov 2017 04:19
DOI: