CUED Publications database

Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition

Flewitt, AJ and Dyson, AP and Robertson, J and Milne, WI (2001) Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition. Thin Solid Films, 383. pp. 172-177. ISSN 0040-6090

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:26
Last Modified: 18 Sep 2014 19:04
DOI: 10.1016/S0040-6090(00)01786-7

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