CUED Publications database

Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition

Flewitt, AJ and Dyson, AP and Robertson, J and Milne, WI (2001) Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition. Thin Solid Films, 383. pp. 172-177. ISSN 0040-6090

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 16 Jul 2015 13:09
Last Modified: 31 Jul 2015 22:31
DOI: 10.1016/S0040-6090(00)01786-7