CUED Publications database

Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition

Flewitt, AJ and Dyson, AP and Robertson, J and Milne, WI (2001) Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition. Thin Solid Films, 383. pp. 172-177. ISSN 0040-6090

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 15 Dec 2015 13:10
Last Modified: 10 Feb 2016 22:23
DOI: 10.1016/S0040-6090(00)01786-7