Lai, DF and Robertson, J and Milne, WI (2001) Plasma oxidation of silicon using an electron cyclotron wave resonance (ecwr) plasma source. Thin Solid Films, 383. pp. 220-223. ISSN 0040-6090
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:44 |
| Last Modified: | 20 May 2013 01:37 |
| DOI: | 10.1016/S0040-6090(00)01621-7 |
Actions (login required)
| View Item |
