CUED Publications database

Plasma oxidation of silicon using an electron cyclotron wave resonance (ecwr) plasma source

Lai, DF and Robertson, J and Milne, WI (2001) Plasma oxidation of silicon using an electron cyclotron wave resonance (ecwr) plasma source. Thin Solid Films, 383. pp. 220-223. ISSN 0040-6090

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 02 Sep 2016 16:34
Last Modified: 24 Sep 2016 02:50
DOI: