CUED Publications database

Plasma oxidation of silicon using an electron cyclotron wave resonance (ecwr) plasma source

Lai, DF and Robertson, J and Milne, WI (2001) Plasma oxidation of silicon using an electron cyclotron wave resonance (ecwr) plasma source. Thin Solid Films, 383. pp. 220-223. ISSN 0040-6090

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:36
Last Modified: 17 Mar 2014 14:30
DOI: 10.1016/S0040-6090(00)01621-7

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