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Optical studies of a-C:H films deposited from CH4, CH4/He, CH4/Ar and CH4/N2 rf plasmas

Tomozeiu, N and Clay, KJ and Milne, WI (2000) Optical studies of a-C:H films deposited from CH4, CH4/He, CH4/Ar and CH4/N2 rf plasmas. Journal of Optoelectronics and Advanced Materials, 2. pp. 43-52. ISSN 0217-9792

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 16 Jul 2015 13:15
Last Modified: 31 Jul 2015 01:03
DOI: