CUED Publications database

High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

Morrison, NA and Rodil, SE and Ferrari, AC and Robertson, J and Milne, WI (1999) High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source. Thin Solid Films, 337. pp. 71-73. ISSN 0040-6090

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Item Type: Article
Subjects: UNSPECIFIED
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Depositing User: Cron job
Date Deposited: 04 Feb 2015 23:15
Last Modified: 05 Feb 2015 01:34
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