Morrison, NA and Rodil, SE and Ferrari, AC and Robertson, J and Milne, WI (1999) High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source. Thin Solid Films, 337. pp. 71-73. ISSN 0040-6090
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| Item Type: | Article |
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| Additional Information: | Volume title: Thin Film Materials for Large Area Electronics. Edited by Equer, B.; Drevillon, B.; French, I.; Kallflas, T. Unmapped Imported Data : Isbn = 1558995013 |
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| Subjects: | UNSPECIFIED |
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| Divisions: | UNSPECIFIED |
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| Depositing User: | Cron Job |
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| Date Deposited: | 28 Oct 2011 16:43 |
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| Last Modified: | 23 Jan 2012 01:47 |
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| DOI: | |
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