CUED Publications database

High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source

Morrison, NA and Rodil, SE and Ferrari, AC and Robertson, J and Milne, WI (1999) High rate deposition of ta-C:H using an electron cyclotron wave resonance plasma source. Thin Solid Films, 337. pp. 71-73. ISSN 0040-6090

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 16 Jul 2015 13:14
Last Modified: 02 Aug 2015 00:52
DOI: