CUED Publications database

Low-temperature anodic oxidation of silicon using a wave resonance plasma source

Uchikoga, S and Lai, DF and Robertson, J and Milne, WI and Hatzopoulos, N and Yankov, RA and Weiler, M (1999) Low-temperature anodic oxidation of silicon using a wave resonance plasma source. Applied Physics Letters, 75. pp. 725-727. ISSN 0003-6951

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:35
Last Modified: 06 Oct 2014 01:24
DOI:

Actions (login required)

View Item