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Low-temperature anodic oxidation of silicon using a wave resonance plasma source

Uchikoga, S and Lai, DF and Robertson, J and Milne, WI and Hatzopoulos, N and Yankov, RA and Weiler, M (1999) Low-temperature anodic oxidation of silicon using a wave resonance plasma source. Applied Physics Letters, 75. pp. 725-727. ISSN 0003-6951

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Item Type: Article
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Depositing User: Unnamed user with email sms67@cam.ac.uk
Date Deposited: 16 Jul 2015 13:14
Last Modified: 30 Jul 2015 21:26
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