Uchikoga, S and Lai, DF and Robertson, J and Milne, WI and Hatzopoulos, N and Yankov, RA and Weiler, M (1999) Low-temperature anodic oxidation of silicon using a wave resonance plasma source. Applied Physics Letters, 75. pp. 725-727. ISSN 0003-6951
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|Item Type: ||Article|
|Additional Information: ||Unmapped Imported Data : Isbn = 1558995013|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:43|
|Last Modified: ||27 May 2013 01:20|
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