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Effect of deposition conditions on the characteristics of reactively sputtered titanium nitride films

Lou, HQ and Axen, N and Somekh, RE and Hutchings, IM (1997) Effect of deposition conditions on the characteristics of reactively sputtered titanium nitride films. Surface & Coatings Technology, 90. pp. 123-127. ISSN 0257-8972

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Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div E > Production Processes
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:13
Last Modified: 23 May 2015 10:54
DOI: