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Effect of deposition conditions on the characteristics of reactively sputtered titanium nitride films

Lou, HQ and Axen, N and Somekh, RE and Hutchings, IM (1997) Effect of deposition conditions on the characteristics of reactively sputtered titanium nitride films. Surface & Coatings Technology, 90. pp. 123-127. ISSN 0257-8972

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Item Type: Article
Additional Information: Publisher: Elsevier Sequoia SA, Switzerland
Subjects: UNSPECIFIED
Divisions: Div E > Production Processes
Depositing User: Cron Job
Date Deposited: 28 Oct 2011 16:34
Last Modified: 16 May 2013 19:16
DOI:

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