Bilek, MMM and Milne, WI (1996) Filtered cathodic vacuum arc (FCVA) deposition of thin film silicon. Thin Solid Films, 290-29. pp. 299-304. ISSN 0040-6090
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|Item Type: ||Article|
|Additional Information: ||Volume title: Metallurgical Coatings and Thin Films. Edited by Sartwell, B. D.; McGuire, G. E.; Jehn, H. A.; Petrov, I. Unmapped Imported Data : Isbn = 1558993711|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:42|
|Last Modified: ||27 May 2013 01:20|
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