Park, JS and Milne, WI (1996) Oxygen plasma reactive ion etching of tetrahedral amorphous carbon. Japanese Journal of Applied Physics Part 2: Letters, 35. L1550-L1553. ISSN 0021-4922
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Additional Information: | Unmapped Imported Data : Isbn = 1558993711 |
| Subjects: | UNSPECIFIED |
| Divisions: | UNSPECIFIED |
| Depositing User: | Cron Job |
| Date Deposited: | 28 Oct 2011 16:42 |
| Last Modified: | 20 May 2013 01:36 |
| DOI: |
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