Park, JS and Milne, WI (1996) Oxygen plasma reactive ion etching of tetrahedral amorphous carbon. Japanese Journal of Applied Physics Part 2: Letters, 35. L1550-L1553. ISSN 0021-4922
Full text not available from this repository.Item Type: | Article |
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Subjects: | UNSPECIFIED |
Divisions: | Div B > Solid State Electronics and Nanoscale Science |
Depositing User: | Cron Job |
Date Deposited: | 17 Jul 2017 20:37 |
Last Modified: | 28 Dec 2017 01:56 |
DOI: |