CUED Publications database

Oxygen plasma reactive ion etching of tetrahedral amorphous carbon

Park, JS and Milne, WI (1996) Oxygen plasma reactive ion etching of tetrahedral amorphous carbon. Japanese Journal of Applied Physics Part 2: Letters, 35. L1550-L1553. ISSN 0021-4922

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Site Admin
Date Deposited: 07 Mar 2014 11:51
Last Modified: 30 Sep 2014 19:08
DOI:

Actions (login required)

View Item