CUED Publications database

Oxygen plasma reactive ion etching of tetrahedral amorphous carbon

Park, JS and Milne, WI (1996) Oxygen plasma reactive ion etching of tetrahedral amorphous carbon. Japanese Journal of Applied Physics Part 2: Letters, 35. L1550-L1553. ISSN 0021-4922

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Item Type: Article
Subjects: UNSPECIFIED
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Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:18
Last Modified: 05 Feb 2015 00:26
DOI:
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