Park, JS and Milne, WI (1996) Oxygen plasma reactive ion etching of tetrahedral amorphous carbon. Japanese Journal of Applied Physics Part 2: Letters, 35. L1550-L1553. ISSN 0021-4922
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | UNSPECIFIED |
| Divisions: | Div B > Solid State Electronics and Nanoscale Science |
| Depositing User: | Cron Job |
| Date Deposited: | 02 Sep 2016 18:25 |
| Last Modified: | 26 Sep 2016 03:50 |
| DOI: |
