Yoon, SF and Ji, R and Ahn, J and Milne, WI (1996) The effects of process pressure and microwave power on the properties of boron-doped SiC:H films prepared using the ECR-CVD technique. Diamond and Related Materials, 5. pp. 1371-1377. ISSN 0925-9635
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|Item Type: ||Article|
|Additional Information: ||Unmapped Imported Data : Isbn = 0780339932 Unmapped Imported Data : Event_dates = 12-13 June 2007|
|Depositing User: ||Cron Job|
|Date Deposited: ||28 Oct 2011 16:42|
|Last Modified: ||27 May 2013 01:20|
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