CUED Publications database

The effects of process pressure and microwave power on the properties of boron-doped SiC:H films prepared using the ECR-CVD technique

Yoon, SF and Ji, R and Ahn, J and Milne, WI (1996) The effects of process pressure and microwave power on the properties of boron-doped SiC:H films prepared using the ECR-CVD technique. Diamond and Related Materials, 5. pp. 1371-1377. ISSN 0925-9635

Full text not available from this repository.
Item Type: Article
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:29
Last Modified: 05 Feb 2015 00:40
DOI: